A diffuse reflectance Fourier transform infrared study of the adsorption and decomposition of dimethyl methylphosphonate on copper oxide supported alumina, 2003

Gatimu, Enid N.

2003-05-01

2000-2009

The adsorption and decomposition characteristics of dimethyl methylphosphonate (DMMP) were studied over copper oxide supported y alumina using diffuse reflectance fourier transform infrared spectroscopy. Our studies indicate that DMMP adsorbs molecularly on the surface of the alumina samples that contained a copper oxide content of less than 1%. This molecular adsorption was primarily via the P=0 bond on the DMMP molecule to a surface site on the metal oxide surface. At copper oxide coverages of higher than 1%, dissociative adsorption of DMMP was observed. There are two mechanisms identified for the dissociative adsorption of DMMP on the surface. One that involves the P=0 bond attaching to a Lewis site on the surface of the supported metal oxide and the other that involves a nucleophilic attack of the phosphorus atom of the DMMP molecule by a surface hydroxyl or oxygen atom

text

application/pdf

2003-05-01

dissertation

Doctor of Philosophy (PhD)

Clark Atlanta University

Department of Chemistry

Mitchell, Mark B.

Clark Atlanta University

Georgia--Atlanta

http://hdl.handle.net/20.500.12322/cau.td:2003_gatimu_enid_n

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